Quartz bath for sapphire substrate etching ACCUBATH® Xe
Quartz bus developed for wet etching of sapphire substrates; the industry's first high-temperature compatible product usable up to 300°C.
Accubath® Xe is designed for etching sapphire substrates, but we believe there are processes that can achieve higher throughput by operating at higher temperatures. The long processes limited by the temperature constraints of previous baths may no longer be practical. This module enables processes at ultra-high temperatures that were previously impossible. We can build and provide systems to tackle new challenges for our customers. By adopting the Accubath® Xe series baths, you can be confident that you will be able to safely and reliably produce the processes you desire.
- 企業：ヒロテック 東京営業所
- 価格：Other
